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Self-consistent description of a dc hollow cathode discharge and analysis of cathode sputtering .

空心阴极直流放电的二维自洽模型描述和阴极溅射分析收藏指正。

The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically .

从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。

Arc ion plating or magnetron sputtering provides the best application condition for pulse technique .

电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。

Fabrication of high-speed photodetectors by sputtering and rapid thermal diffusion techniques .

以溅镀及快速热扩散技术制备高速光侦测器之研究。

The study of antireflection coating on plastic substrates by reactive sputtering .

使用反应溅镀法於塑胶基板上制镀抗反射膜之研究。